Silicon Wafer—Silicon Oxide Wafer (Domestic/imported)
Silicon Wafer—Silicon Oxide Wafer (domestic/imported)
1. Diameter: 2~8 inches
2. Thickness of oxide layer: 50Å～20um3. Silicon oxide wafer refers to the presence of an oxide layer on the surface of silicon wafer. The thickness of the oxide layer is customized according to user needs. Thermal oxidation processing.
3. The oxide layer with a thickness of 2um needs to be customized.
4. According to the product process requirements, different processes of dry, wet, dry oxygen and pure dry oxygen oxide sheets can be provided, and the process application needs to be informed when consulting.