Reactive ion etching

Type: Plasma pro 100 RIE

Manufacturer: OXFORD (England)

The PlasmaPro 100 RIE modules deliver anisotropic dry etching for an extensive range of processes.

•Compatible with all wafer sizes up to 200mm 

•Excellent uniformity, high throughput and high precision processes 

•In-situ chamber cleaning and end-pointing

•Wide temperature range electrode, -150°C to 400°C