Atomic layer deposition

Type: Picosun  R-200

Manufacturer: PICOSUN (Finland)

Sample size: ≤8 inches
Process temperature: ＜450℃
Pre-drive source pipeline: 6 sets of independent pipelines
Plasma system: 100-3000W; 1.7-3MHz
Deposition materials: SiO2, Si3N4, TiN, etc.

Uniformity: 6 inches≤±3%