Electron beam evaporation

Type:VZZS-650 

Manufacturer : VNANO (China)

Deposited material: metal（Au, Ag, Al, Ti, Pt, Mo, Fe, Cr, Ni）、compound material（ITO）, dielectrics (SiO2, Si3N4, Al2O3, etc. )

Main pump: 1200L/s or 1600 L/s molecular pump, imported magnetic levitation molecular pump or cryopump

Vacuum limit: 5×10-5Pa(3.75×10-7Torr) ~3×10-6Pa(2×10-8Torr)；

E-type electron gun: anode voltage 6KV-10KV, with XY deflection scanning; 4-8 cavities crucible optional, 12cc, 22cc, 40cc etc.

Maximum 180mm substrate/15～25mm ITO/FTO glass 30 pieces/arch or hemispherical sample holder, can be customized integrated high-precision etching mask; substrate table revolution, rotation speed 0-25rpm continuously adjustable;

Flat substrate :The substrate can be heated or water cooled;