The microporous silicon nitride thin-film window is fabricated from an in-situ chip via MEMS (Micro-Electro-Mechanical Systems) technology, with a micro-nano pore array processed on the window thin-film.
The silicon nitride window thin-film exhibits characteristics such as high cleanliness, high X-ray transmittance, high temperature resistance, low stress, and uniform film thickness, making it suitable for research in multiple fields.
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